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      Electrical breakdown in thin gate and tunneling oxides

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          Dielectric breakdown in electrically stressed thin films of thermal SiO2

          Eli Harari (1978)
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            Process Optimization of Radiation-Hardened CMOS Integrated Circuits

            G. F. Derbenwick, B. Gregory (1975)
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              Impact ionization model for dielectric instability and breakdown

              T. H. DiStefano, M. Shatzkes (1974)
              Article 0 comments Cited 64 times – based on 0 reviews     Review now
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                Author and article information

                Journal
                Title: IEEE Transactions on Electron Devices
                Abbreviated Title: IEEE Trans. Electron Devices
                Publisher: Institute of Electrical and Electronics Engineers (IEEE)
                ISSN (Print): 0018-9383
                Publication date Created: February 1985
                Publication date (Print): February 1985
                Volume: 32
                Issue: 2
                Pages: 413-422
                Article
                DOI: 10.1109/T-ED.1985.21957
                SO-VID: d733d4dd-b5e9-44df-9118-70bb3b4925d3
                Copyright © © 1985
                History

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