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      A Membrane Model For Positive Photoresist Development

      proceedings-article
      Author(s): 1
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      Publication date (Online):
      Conference name: 1986 Microlithography Conferences
      Conference date: Monday 10 March 1986

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          Conference
          Publication date (Online): July 9 1986
          Publication date (Print): July 9 1986
          Page: 124
          Affiliations
          [1 ]Eastman Kodak Company (United States)
          Article
          DOI: 10.1117/12.963634
          SO-VID: e0b16b21-2e05-4142-8d52-7490609c481a
          Copyright © © 1986
          Conference name: 1986 Microlithography Conferences
          Conference location: Santa Clara
          Conference date: Monday 10 March 1986
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