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      Chemical Vapor Deposition of Highly Conjugated, Transparent Boron Carbon Nitride Thin Films

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          Abstract

          Ternary materials made up only from the lightweight elements boron, carbon, and nitrogen are very attractive due to their tunable properties that can be obtained by changing the relative elemental composition. However, most of the times, the synthesis requires to use up to three different precursor and very high temperatures for the synthesis. Moreover, the low reciprocal solubility of boron nitride and graphene often leads to BN‐C composite materials due to phase segregation. Herein, an innovative method is presented to prepare BCN thin films by chemical vapor deposition from a single source precursor, melamine diborate. The deposition occurs homogenously at relatively low temperatures generating very high degree of sp 2 conjugation. The as‐prepared thin films possess high transparency and refractive index values in the visible range that are of interest for reflective mirrors and lenses. Furthermore, they are wide‐bandgap semiconductor with very positive valence band, making these materials very stable against oxidation of interest as protective coating and charge transport layer for solar cells. The simple chemical vapor deposition method that relies on commonly available and low‐hazard precursor can open the way for application of BCN thin films in optics, optoelectronics, and beyond.

          Abstract

          Boron carbon nitride thin films recently have attracted much interest due to the wide range of application and tunability of these materials. Here, an innovative method is presented to obtain highly conjugated, visible, transparent BCN thin films via chemical vapor deposition. The prepared films show a high refractive index and high oxidation potential.

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          Most cited references3

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          Springer Handbook of Electronic and Photonic Materials

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            NIST X-Ray Photoelctron Spectroscopy Database

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              Electron Energy‐Loss Spectroscopy in the Electron Microscope

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                Author and article information

                Contributors
                Paolo.Giusto@mpikg.mpg.de
                Office.cc@mpikg.mpg.de
                Journal
                Adv Sci (Weinh)
                Adv Sci (Weinh)
                10.1002/(ISSN)2198-3844
                ADVS
                Advanced Science
                John Wiley and Sons Inc. (Hoboken )
                2198-3844
                03 July 2021
                September 2021
                : 8
                : 17 ( doiID: 10.1002/advs.v8.17 )
                : 2101602
                Affiliations
                [ 1 ] Max Planck Institute of Colloids and Interfaces Department of Colloid Chemistry Am Mühlenberg 1 Potsdam 14476 Germany
                [ 2 ] Department of Physics University of Pavia Via Bassi, 6 Pavia 27100 Italy
                Author notes
                Author information
                https://orcid.org/0000-0003-4181-6500
                Article
                ADVS2769
                10.1002/advs.202101602
                8425861
                34218530
                493048de-789f-4415-804b-6983f5a7a72f
                © 2021 The Authors. Advanced Science published by Wiley‐VCH GmbH

                This is an open access article under the terms of the http://creativecommons.org/licenses/by/4.0/ License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.

                History
                : 19 April 2021
                Page count
                Figures: 4, Tables: 0, Pages: 7, Words: 5222
                Funding
                Funded by: Max Planck Society , doi 10.13039/501100004189;
                Categories
                Research Article
                Research Articles
                Custom metadata
                2.0
                September 8, 2021
                Converter:WILEY_ML3GV2_TO_JATSPMC version:6.0.7 mode:remove_FC converted:08.09.2021

                boron carbon nitride,chemical vapor deposition,optical properties,refractive index,thin films

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