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      Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS

      , , , ,
      Journal of Micromechanics and Microengineering
      IOP Publishing

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          Three-dimensional micro-channel fabrication in polydimethylsiloxane (PDMS) elastomer

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            High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS

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              • Record: found
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              Micromachining applications of a high resolution ultrathick photoresist

              K. Lee (1995)
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                Author and article information

                Journal
                Journal of Micromechanics and Microengineering
                J. Micromech. Microeng.
                IOP Publishing
                0960-1317
                1361-6439
                January 01 2001
                January 01 2001
                : 11
                : 1
                : 20-26
                Article
                10.1088/0960-1317/11/1/304
                99511f64-0d3a-4ab1-95d1-648a796fa108
                © 2001
                History

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