0
views
0
recommends
+1 Recommend
0 collections
    0
    shares
      • Record: found
      • Abstract: not found
      • Article: not found

      Silicon doped hafnium oxide (HSO) and hafnium zirconium oxide (HZO) based FeFET: A material relation to device physics

      Read this article at

      ScienceOpenPublisher
      Bookmark
          There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

          Related collections

          Most cited references21

          • Record: found
          • Abstract: not found
          • Article: not found

          Ferroelectricity in hafnium oxide thin films

            Bookmark
            • Record: found
            • Abstract: found
            • Article: not found

            Ferroelectricity in Simple Binary ZrO2 and HfO2.

            The transition metal oxides ZrO(2) and HfO(2) as well as their solid solution are widely researched and, like most binary oxides, are expected to exhibit centrosymmetric crystal structure and therewith linear dielectric characteristics. For this reason, those oxides, even though successfully introduced into microelectronics, were never considered to be more than simple dielectrics possessing limited functionality. Here we report the discovery of a field-driven ferroelectric phase transition in pure, sub 10 nm ZrO(2) thin films and a composition- and temperature-dependent transition to a stable ferroelectric phase in the HfO(2)-ZrO(2) mixed oxide. These unusual findings are attributed to a size-driven tetragonal to orthorhombic phase transition that in thin films, similar to the anticipated tetragonal to monoclinic transition, is lowered to room temperature. A structural investigation revealed the orthorhombic phase to be of space group Pbc2(1), whose noncentrosymmetric nature is deemed responsible for the spontaneous polarization in this novel, nanoscale ferroelectrics.
              Bookmark
              • Record: found
              • Abstract: not found
              • Article: not found

              Incipient Ferroelectricity in Al-Doped HfO2 Thin Films

                Bookmark

                Author and article information

                Journal
                Applied Physics Letters
                Appl. Phys. Lett.
                AIP Publishing
                0003-6951
                1077-3118
                May 28 2018
                May 28 2018
                : 112
                : 22
                : 222903
                Affiliations
                [1 ]Fraunhofer IPMS, Center Nanoelectronic Technologies (CNT), Königsbrücker Str. 178, 01099 Dresden, Germany
                Article
                10.1063/1.5029324
                c3fbd129-22ad-4a7e-a0de-b466d62ced68
                © 2018
                History

                Comments

                Comment on this article