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      Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma

      Journal of Non-Crystalline Solids
      Elsevier BV

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          The preparation of thin layers of Ge and Si by chemical hydrogen plasma transport

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            Electrical and Structural Properties of Phosphorous-Doped Glow-Discharge Si:F:H and Si:H Films

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              Plasma spectroscopy—Glow discharge deposition of hydrogenated amorphous silicon

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                Author and article information

                Journal
                Journal of Non-Crystalline Solids
                Journal of Non-Crystalline Solids
                Elsevier BV
                00223093
                December 1983
                December 1983
                : 59-60
                :
                : 767-774
                Article
                10.1016/0022-3093(83)90284-3
                d5d3a9a8-4b3e-484c-a349-82ebcffbc344
                © 1983

                http://www.elsevier.com/tdm/userlicense/1.0/

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