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      Germanium microlasers on metallic pedestals

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          Lasing in direct-bandgap GeSn alloy grown on Si

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            An electrically pumped germanium laser.

            Electrically pumped lasing from Germanium-on-Silicon pnn heterojunction diode structures is demonstrated. Room temperature multimode laser with 1mW output power is measured. Phosphorous doping in Germanium at a concentration over 4x10 19 cm -3 is achieved. A Germanium gain spectrum of nearly 200nm is observed.
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              Second-harmonic generation in silicon waveguides strained by silicon nitride.

              Silicon photonics meets the electronics requirement of increased speed and bandwidth with on-chip optical networks. All-optical data management requires nonlinear silicon photonics. In silicon only third-order optical nonlinearities are present owing to its crystalline inversion symmetry. Introducing a second-order nonlinearity into silicon photonics by proper material engineering would be highly desirable. It would enable devices for wideband wavelength conversion operating at relatively low optical powers. Here we show that a sizeable second-order nonlinearity at optical wavelengths is induced in a silicon waveguide by using a stressing silicon nitride overlayer. We carried out second-harmonic-generation experiments and first-principle calculations, which both yield large values of strain-induced bulk second-order nonlinear susceptibility, up to 40 pm V(-1) at 2,300 nm. We envisage that nonlinear strained silicon could provide a competing platform for a new class of integrated light sources spanning the near- to mid-infrared spectrum from 1.2 to 10 μm.
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                Author and article information

                Journal
                APL Photonics
                APL Photonics
                AIP Publishing
                2378-0967
                October 2018
                October 2018
                : 3
                : 10
                : 106102
                Affiliations
                [1 ]Centre de Nanosciences et de Nanotechnologies, CNRS, Université Paris-Sud, Université Paris-Saclay, Bâtiment 220, Rue André Ampère, F-91405 Orsay, France
                [2 ]STMicroelectronics, 850 Rue Jean Monnet, F-38920 Grenoble, France
                Article
                10.1063/1.5025705
                e6b03b02-6b4d-4c64-9403-41a307be0140
                © 2018
                History

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