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ZnO/Al2O3 nanolaminates fabricated by atomic layer deposition: growth and surface roughness measurements
Author(s):
J.W. Elam
,
Z.A. Sechrist
,
S.M. George
Publication date
Created:
July 2002
Publication date
(Print):
July 2002
Journal:
Thin Solid Films
Publisher:
Elsevier BV
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Atomic Force Microscopy
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52
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Surface Chemistry for Atomic Layer Growth
J. Klaus
,
S M George
,
A. W. Ott
(1996)
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Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry
J.W. Klaus
,
J.M. Johnson
,
S.M. George
…
(1997)
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Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence
A.C. Dillon
,
A.W. Ott
,
J.D. Way
…
(1995)
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Author and article information
Journal
Title:
Thin Solid Films
Abbreviated Title:
Thin Solid Films
Publisher:
Elsevier BV
ISSN (Print):
00406090
Publication date Created:
July 2002
Publication date (Print):
July 2002
Volume
: 414
Issue
: 1
Pages
: 43-55
Article
DOI:
10.1016/S0040-6090(02)00427-3
SO-VID:
e9280d0a-1dbf-4a00-9f7e-800d634d7e91
Copyright ©
© 2002
License:
http://www.elsevier.com/tdm/userlicense/1.0/
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