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      ZnO/Al2O3 nanolaminates fabricated by atomic layer deposition: growth and surface roughness measurements

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      Thin Solid Films
      Elsevier BV

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          Surface Chemistry for Atomic Layer Growth

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            Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry

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              Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence

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                Author and article information

                Journal
                Thin Solid Films
                Thin Solid Films
                Elsevier BV
                00406090
                July 2002
                July 2002
                : 414
                : 1
                : 43-55
                Article
                10.1016/S0040-6090(02)00427-3
                e9280d0a-1dbf-4a00-9f7e-800d634d7e91
                © 2002

                http://www.elsevier.com/tdm/userlicense/1.0/

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