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      A Framework for Understanding Radiation-Induced Interface States in SiO2 MOS Structures

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          Model for the Electronic Structure of Amorphous Semiconductors

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            States in the Gap in Glassy Semiconductors

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              High-Resolution X-Ray Photoelectron Spectroscopy as a Probe of Local Atomic Structure: Application to Amorphous SiO2and the Si-SiO2Interface

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                Author and article information

                Journal
                IEEE Transactions on Nuclear Science
                IEEE Trans. Nucl. Sci.
                Institute of Electrical and Electronics Engineers (IEEE)
                0018-9499
                December 1980
                1980
                : 27
                : 6
                : 1651-1657
                Article
                10.1109/TNS.1980.4331084
                19ed2218-17f9-436a-9e24-bec2b20af927
                © 1980
                History

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