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      Undoped and in-situ B doped GeSn epitaxial growth on Ge by atmospheric pressure-chemical vapor deposition

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          Ge–Sn semiconductors for band-gap and lattice engineering

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            TIN-BASED GROUP IV SEMICONDUCTORS: New Platforms for Opto- and Microelectronics on Silicon

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              Germanium-tin p-i-n photodetectors integrated on silicon grown by molecular beam epitaxy

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                Author and article information

                Journal
                Applied Physics Letters
                Appl. Phys. Lett.
                AIP Publishing
                0003-6951
                1077-3118
                October 10 2011
                October 10 2011
                : 99
                : 15
                : 152103
                Article
                10.1063/1.3645620
                1afb2d2a-e792-43c7-beba-0be14415cfe4
                © 2011
                History

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