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      Effect of fluoroalkyl substituents on the reactions of alkylchlorosilanes with mold surfaces for nanoimprint lithography

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          Step and flash imprint lithography: Template surface treatment and defect analysis

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            Problems of the nanoimprinting technique for nanometer scale pattern definition

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              Evidence of a transition temperature for the optimum deposition of grafted monolayer coatings

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                Author and article information

                Journal
                JVTBD9
                Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
                J. Vac. Sci. Technol. B
                American Vacuum Society
                0734211X
                2004
                2004
                : 22
                : 6
                : 3233
                Article
                10.1116/1.1815305
                203309fd-0971-4cd8-af11-6380e38aba92
                © 2004
                History

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