Tin oxide gas sensor fabricated using CMOS micro-hotplates and in-situ processing

Gaitan, M.; Cavicchi, R.E.; Semancik, S.; Suehle, J.S.

doi:10.1109/55.215130

Record: found
Abstract: not found
Article: not found

Tin oxide gas sensor fabricated using CMOS micro-hotplates and in-situ processing

Author(s): J.S. Suehle , R.E. Cavicchi , M. Gaitan , S. Semancik

Publication date (Print): March 1993

Journal: IEEE Electron Device Letters

Publisher: Institute of Electrical and Electronics Engineers (IEEE)

Read this article at

ScienceOpenPublisher

Bookmark

There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

Related collections

Most cited references 13

Record: found
Abstract: not found
Article: not found

Anisotropic etching of silicon

K.E. Bean (1978)

0 comments Cited 143 times – based on 0 reviews      Review now

Bookmark

Record: found
Abstract: not found
Article: not found

Fabrication of novel three-dimensional microstructures by the anisotropic etching of

E. Bassous (1978)

0 comments Cited 59 times – based on 0 reviews      Review now

Bookmark

Record: found
Abstract: not found
Article: not found

Ethylene Diamine-Pyrocatechol-Water Mixture Shows Etching Anomaly in Boron-Doped Silicon

A. Bohg (1971)

0 comments Cited 34 times – based on 0 reviews      Review now

Bookmark

All references

Author and article information

Journal

Title: IEEE Electron Device Letters

Abbreviated Title: IEEE Electron Device Lett.

Publisher: Institute of Electrical and Electronics Engineers (IEEE)

ISSN (Print): 0741-3106

ISSN (Electronic): 1558-0563

Publication date Created: March 1993

Publication date (Print): March 1993

Volume: 14

Issue: 3

Pages: 118-120

Article

DOI: 10.1109/55.215130

SO-VID: a0defdaf-28dc-4d69-a177-9f93de574faa

History

Data availability:

Tin oxide gas sensor fabricated using CMOS micro-hotplates and in-situ processing

Read this article at

Related collections

Genome Engineering using CRISPR

Most cited references 13

Anisotropic etching of silicon

Fabrication of novel three-dimensional microstructures by the anisotropic etching of

Ethylene Diamine-Pyrocatechol-Water Mixture Shows Etching Anomaly in Boron-Doped Silicon

Author and article information

Journal

Article

History

Comments

Comment on this article

Similar content 2,547

Cited by 62

Most referenced authors 60