Tin oxide gas sensor fabricated using CMOS micro-hotplates and in-situ processing

Gaitan, M.; Cavicchi, R.E.; Semancik, S.; Suehle, J.S.

doi:10.1109/55.215130

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Tin oxide gas sensor fabricated using CMOS micro-hotplates and in-situ processing

Author(s): J.S. Suehle , R.E. Cavicchi , M. Gaitan , S. Semancik

Publication date (Print): March 1993

Journal: IEEE Electron Device Letters

Publisher: Institute of Electrical and Electronics Engineers (IEEE)

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Anisotropic etching of silicon

K.E. Bean (1978)

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Fabrication of novel three-dimensional microstructures by the anisotropic etching of

E. Bassous (1978)

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Ethylene Diamine-Pyrocatechol-Water Mixture Shows Etching Anomaly in Boron-Doped Silicon

A. Bohg (1971)

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Title: IEEE Electron Device Letters

Abbreviated Title: IEEE Electron Device Lett.

Publisher: Institute of Electrical and Electronics Engineers (IEEE)

ISSN (Print): 0741-3106

ISSN (Electronic): 1558-0563

Publication date Created: March 1993

Publication date (Print): March 1993

Volume: 14

Issue: 3

Pages: 118-120

Article

DOI: 10.1109/55.215130

SO-VID: a0defdaf-28dc-4d69-a177-9f93de574faa

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Tin oxide gas sensor fabricated using CMOS micro-hotplates and in-situ processing

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Genome Engineering using CRISPR

Most cited references 13

Anisotropic etching of silicon

Fabrication of novel three-dimensional microstructures by the anisotropic etching of

Ethylene Diamine-Pyrocatechol-Water Mixture Shows Etching Anomaly in Boron-Doped Silicon

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