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      Fabrication of tensile-strained single-crystalline GeSn on transparent substrate by nucleation-controlled liquid-phase crystallization

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          Band structure, deformation potentials, and carrier mobility in strained Si, Ge, and SiGe alloys

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            Lasing in direct-bandgap GeSn alloy grown on Si

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              Resistivity, mobility and impurity levels in GaAs, Ge, and Si at 300°K

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                Author and article information

                Journal
                Applied Physics Letters
                Appl. Phys. Lett.
                AIP Publishing
                0003-6951
                1077-3118
                January 16 2017
                January 16 2017
                : 110
                : 3
                : 032104
                Affiliations
                [1 ]Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
                [2 ]Japan Synchrotron Radiation Research Institute (JASRI), Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan
                Article
                10.1063/1.4974473
                fa1e81c5-7b54-42b2-97e2-120aa2afe974
                © 2017
                History

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