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      In-polar InN grown by plasma-assisted molecular beam epitaxy

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          Control of GaN surface morphologies using plasma-assisted molecular beam epitaxy

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            Surface charge accumulation of InN films grown by molecular-beam epitaxy

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              Native defects and impurities in InN: First-principles studies using the local-density approximation and self-interaction and relaxation-corrected pseudopotentials

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                Author and article information

                Journal
                Applied Physics Letters
                Appl. Phys. Lett.
                AIP Publishing
                0003-6951
                1077-3118
                July 17 2006
                July 17 2006
                : 89
                : 3
                : 032109
                Article
                10.1063/1.2234274
                2ab06e61-89d0-4798-87e0-dc9a2888bcb3
                © 2006
                History

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