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      Relaxation of strained‐layer semiconductor structures via plastic flow

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      Applied Physics Letters
      AIP Publishing

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          GexSi1−x/Si strained‐layer superlattice grown by molecular beam epitaxy

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            Accommodation of Misfit Across the Interface Between Crystals of Semiconducting Elements or Compounds

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              Determination of critical layer thickness in InxGa1−xAs/GaAs heterostructures by x‐ray diffraction

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                Author and article information

                Journal
                Applied Physics Letters
                Appl. Phys. Lett.
                AIP Publishing
                0003-6951
                1077-3118
                October 26 1987
                October 26 1987
                : 51
                : 17
                : 1325-1327
                Article
                10.1063/1.98667
                fbde9c59-5ce2-4a61-819a-0cab873dc4eb
                © 1987
                History

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