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      Commensurate and incommensurate structures in molecular beam epitaxially grown GexSi1−xfilms on Si(100)

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      Journal of Applied Physics
      AIP Publishing

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          Lattice Parameter and Density in Germanium-Silicon Alloys1

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            On the Theory of Interfacial Energy and Elastic Strain of Epitaxial Overgrowths in Parallel Alignment on Single Crystal Substrates

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              • Record: found
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              Pseudomorphic growth of GexSi1−xon silicon by molecular beam epitaxy

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                Author and article information

                Journal
                Journal of Applied Physics
                Journal of Applied Physics
                AIP Publishing
                0021-8979
                1089-7550
                August 15 1984
                August 15 1984
                : 56
                : 4
                : 1227-1229
                Article
                10.1063/1.334055
                5c0aa1b6-4000-4184-b561-5e6be15081ca
                © 1984
                History

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